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ALD Process at IMI

IMI can deliver results that require materials control at the atomic scale. Atomic Layer Deposition (ALD) is one of the tools used extensively to engineer materials and devices at this elemental level. IMI adds the speed and flexibility of high-throughput processing to ALD with its site-isolated, quad combi ALD reactor technology. Four separate ALD processes can be performed in different regions of the same substrate, simultaneously enabling faster ALD process development and device evaluations.

IMI ALD_chamber